Principles of chemical vapor deposition /
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| Other Authors: | , |
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| Format: | Book |
| Language: | English |
| Published: |
Dordrecht, The Netherlands
Kluwer Academic Publishers
2003.
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| LEADER | 01278cam a2200337 a 4500 | ||
|---|---|---|---|
| 001 | vtls000022951 | ||
| 005 | 20210709190713.0 | ||
| 003 | MY-ArUMP | ||
| 008 | 120302s2003 na a f b 001 0 eng | ||
| 020 | |a 1402012489 |c RM529.17 | ||
| 035 | |a (OCoLC)ocm52058209 | ||
| 039 | 9 | |a 201203021010 |b SMT |c 201111291530 |d VLOAD |c 201111290959 |d VLOAD |c 200803150647 |d VLOAD |y BK-REF00601201636 |z FS |e SNSA | |
| 040 | |a MYPMP |b eng |e rda |c MYPMP | ||
| 090 | 0 | 0 | |a TS695 |b P957 2003 |
| 245 | 0 | 0 | |a Principles of chemical vapor deposition / |c [edited by] Daniel M. Dobkin and Michael K. Zuraw. |
| 264 | 1 | |a Dordrecht, The Netherlands |b Kluwer Academic Publishers |c 2003. | |
| 300 | |a xi, 273 pages: |b illustrations ; |c 24 cm. | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a unmediated |b n |2 rdamedia | ||
| 338 | |a volume |b nc |2 rdacarrier | ||
| 541 | |a BOOKLINE SERVICES |d 24-01-06 | ||
| 591 | |a PER.2/O/06/013(h) | ||
| 594 | |a 02-04-07 | ||
| 650 | 0 | |a Vapor-plating. | |
| 650 | 0 | |a Refractory coating. | |
| 700 | 1 | |a Zuraw, Michael K. | |
| 700 | 1 | |a Dobkin, Daniel Mark. | |
| 942 | |2 lcc |c BK-OS | ||
| 949 | |a VIRTUAITEM |d 30000 |f 1 |x 1 |6 025368 | ||
| 999 | |c 16214 |d 16214 | ||
| 952 | |0 0 |1 0 |2 lcc |4 0 |6 TS0695 P957 02003 |7 0 |9 20273 |a PTSFP |b PTSFP |c 1 |d 2021-07-09 |o TS695 P957 2003 |p 025368 |r 2021-07-09 |t 1 |w 2021-07-09 |y BK-OS | ||