APA (7th ed.) Citation

Cheong Yew Shun. (2008). Contact hole printing beyond 190NM in photolithography processing using resolution enhancement techniques. Universiti Malaysia Perlis (UniMAP).

Chicago Style (17th ed.) Citation

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Kangar: Universiti Malaysia Perlis (UniMAP), 2008.

MLA (8th ed.) Citation

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Universiti Malaysia Perlis (UniMAP), 2008.