Citace podle APA (7th ed.)

Cheong Yew Shun. (2008). Contact hole printing beyond 190NM in photolithography processing using resolution enhancement techniques. Universiti Malaysia Perlis (UniMAP).

Citace podle Chicago (17th ed.)

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Kangar: Universiti Malaysia Perlis (UniMAP), 2008.

Citace podle MLA (8th ed.)

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Universiti Malaysia Perlis (UniMAP), 2008.

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