APA-referens (7:e uppl.)

Cheong Yew Shun. (2008). Contact hole printing beyond 190NM in photolithography processing using resolution enhancement techniques. Universiti Malaysia Perlis (UniMAP).

Chicago-referens (17:e uppl.)

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Kangar: Universiti Malaysia Perlis (UniMAP), 2008.

MLA-referens (8:e uppl.)

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Universiti Malaysia Perlis (UniMAP), 2008.

Varning: dessa hänvisningar är inte alltid fullständigt riktiga.