Cheong Yew Shun. (2008). Contact hole printing beyond 190NM in photolithography processing using resolution enhancement techniques. Universiti Malaysia Perlis (UniMAP).
Stile di citazione ChicagoCheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Kangar: Universiti Malaysia Perlis (UniMAP), 2008.
Citazione MLACheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Universiti Malaysia Perlis (UniMAP), 2008.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.