APA aipamena

Cheong Yew Shun. (2008). Contact hole printing beyond 190NM in photolithography processing using resolution enhancement techniques. Universiti Malaysia Perlis (UniMAP).

Chicago Style aipamena

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Kangar: Universiti Malaysia Perlis (UniMAP), 2008.

MLA aipamena

Cheong Yew Shun. Contact Hole Printing Beyond 190NM in Photolithography Processing Using Resolution Enhancement Techniques. Universiti Malaysia Perlis (UniMAP), 2008.