Contact hole printing beyond 190NM in photolithography processing using resolution enhancement techniques
Gorde:
| Egile nagusia: | Cheong Yew Shun (Egilea) |
|---|---|
| Erakunde egilea: | Universiti Malaysia Perlis |
| Formatua: | Thesis Liburua |
| Hizkuntza: | English |
| Argitaratua: |
Kangar
Universiti Malaysia Perlis (UniMAP)
2008
|
| Gaiak: | |
| Etiketak: |
Etiketa erantsi
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Antzeko izenburuak
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Photo-offset /
nork: Lathrop, Irvin T.
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Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor /
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Argitaratua: (2016) -
Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor /
nork: Nurulbariah Idris author
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Development of three dimensional (3D) grayscale photolithography process for microfluidic curvature structures /
nork: Intan Sue Liana Abdul Hamid
Argitaratua: (2018) -
Jurucetak lithographic (lithographic pressman) : F-022-1, jurucetak lithographic kanan = senior lithographic pressman : F-022-2, penyelia percetakan lithographic = lithographic press supervisor : F-022-3
Argitaratua: (2001)