Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /
The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
Gardado en:
Autor Principal: | |
---|---|
Autor Corporativo: | |
Formato: | Thesis Software eBook |
Idioma: | English |
Publicado: |
Kangar
Universiti Malaysia Perlis (UniMAP)
2007.
|
Subjects: | |
Tags: |
Engadir etiqueta
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!
|
Summary: | The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method. |
---|---|
descrición da copia: | Tesis 2007 Accompanied by CD-ROM (901000006) |
Descrición Física: | xxv, 108 p. ill. 30 cm. + 1 CD-ROM (4 3/4 in.) |