Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /

Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /

The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Prif Awdur: Mohammad Nuzaihan Bin Md Nor (Awdur)
Awdur Corfforaethol: Universiti Malaysia Perlis
Fformat: Traethawd Ymchwil Meddalwedd eLyfr
Iaith:English
Cyhoeddwyd: Kangar Universiti Malaysia Perlis (UniMAP) 2007.
Pynciau:
Nanowires
Nanostructure materials > Electric properties
Electrochemistry.
Tagiau: Ychwanegu Tag
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Disgrifiad
Crynodeb:The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
Disgrifiad o'r Eitem:Tesis 2007
Accompanied by CD-ROM (901000006)
Disgrifiad Corfforoll:xxv, 108 p. ill. 30 cm. + 1 CD-ROM (4 3/4 in.)

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