Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /
The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
Sábháilte in:
| Príomhchruthaitheoir: | |
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| Údar corparáideach: | |
| Formáid: | Tráchtas Bogearraí Ríomhleabhar |
| Teanga: | English |
| Foilsithe / Cruthaithe: |
Kangar
Universiti Malaysia Perlis (UniMAP)
2007.
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| Ábhair: | |
| Clibeanna: |
Cuir clib leis
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
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| Achoimre: | The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method. |
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| Cur síos ar an mír: | Tesis 2007 Accompanied by CD-ROM (901000006) |
| Cur síos fisiciúil: | xxv, 108 p. ill. 30 cm. + 1 CD-ROM (4 3/4 in.) |