Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /
The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
Wedi'i Gadw mewn:
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| Awdur Corfforaethol: | |
| Fformat: | Traethawd Ymchwil Meddalwedd eLyfr |
| Iaith: | English |
| Cyhoeddwyd: |
Kangar
Universiti Malaysia Perlis (UniMAP)
2007.
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| Pynciau: | |
| Tagiau: |
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