Study of aspect ratio performance on silicon oxide etching using profiler meter, AFM and SEM
The scope of this final year project is to get a high aspect ratio for etch profile using wet etching technique. After etching process using Buffered Oxide Etch (BOE), the structure profile had to viewed under profiler meter, Atomic Forces Microscopy (AFM) Scanning Electron Microscope (SEM).
Sábháilte in:
| Príomhchruthaitheoir: | |
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| Formáid: | Leictreonach Bogearraí Bunachar sonraí |
| Teanga: | English |
| Ábhair: | |
| Clibeanna: |
Cuir clib leis
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
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| Achoimre: | The scope of this final year project is to get a high aspect ratio for etch profile using wet etching technique. After etching process using Buffered Oxide Etch (BOE), the structure profile had to viewed under profiler meter, Atomic Forces Microscopy (AFM) Scanning Electron Microscope (SEM). |
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| Cur síos ar an mír: | Final Year Project |
| Cur síos fisiciúil: | 1 CD-ROM 4 3/4 in. |