Study of aspect ratio performance on silicon oxide etching using profiler meter, AFM and SEM

The scope of this final year project is to get a high aspect ratio for etch profile using wet etching technique. After etching process using Buffered Oxide Etch (BOE), the structure profile had to viewed under profiler meter, Atomic Forces Microscopy (AFM) Scanning Electron Microscope (SEM).

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Autor principal: Nur Syuhada Md. Desa (Autor)
Format: Electrònic Software Base de dades
Idioma:English
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