Optimization of nitride deposition process using Taguchi method

Optimization of nitride deposition process using Taguchi method

This final year project is mainly focused on obtaining the most optimize parameters of PECVD Si3N4 deposition process by using DOE. The Taguchi method of DOE will be used in performing optimization of the deposition process. Raw data for the deposition process is provided by the deposition module fr...

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Bibliografski detalji
Glavni autor:	Low, Zen Shiang (Autor)
Format:	Elektronički Softver Baza podataka
Jezik:	English
Teme:	Microelectronics.
Oznake:	Dodaj oznaku Bez oznaka, Budi prvi tko označuje ovaj zapis!

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