Study on diffusivity of gallium dopant in silicon using spin on dopant (SOD) technique
In this final year project the diffusivity of gallium using spin on dopant technique is studied. The study includes mathematical calculation, computer simulation, fabrication and characterization of the diffusivity criteria such as surface concentration, dopant profiling and resistivity.
Salvato in:
| Autore principale: | |
|---|---|
| Natura: | Elettronico Software Database |
| Lingua: | English |
| Soggetti: | |
| Tags: |
Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne! !
|
| Riassunto: | In this final year project the diffusivity of gallium using spin on dopant technique is studied. The study includes mathematical calculation, computer simulation, fabrication and characterization of the diffusivity criteria such as surface concentration, dopant profiling and resistivity. |
|---|---|
| Descrizione del documento: | Final Year Project |
| Descrizione fisica: | 1 CD-ROM 4 3/4 in. |