Study of the temperature effect on thickness and surface roughness of Si02
The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process....
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| Médium: | Elektronický zdroj Program Databáze |
| Jazyk: | English |
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| Shrnutí: | The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process. |
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| Popis jednotky: | Final Year Project |
| Fyzický popis: | 1 CD-ROM 4 3/4 in. |