Study of the temperature effect on thickness and surface roughness of Si02
The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process....
में बचाया:
| मुख्य लेखक: | |
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| स्वरूप: | इलेक्ट्रोनिक सॉफ्टवेयर डेटाबेस |
| भाषा: | English |
| विषय: | |
| टैग : |
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| सारांश: | The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process. |
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| वस्तु वर्णन: | Final Year Project |
| भौतिक वर्णन: | 1 CD-ROM 4 3/4 in. |