Study of the temperature effect on thickness and surface roughness of Si02

Study of the temperature effect on thickness and surface roughness of Si02

The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process....

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Dades bibliogràfiques
Autor principal:	Mohd Azdi Asis (Autor)
Format:	Electrònic Software Base de dades
Idioma:	English
Matèries:	Microelectronics.
Etiquetes:	Afegir etiqueta Sense etiquetes, Sigues el primer a etiquetar aquest registre!

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