Study of the temperature effect on thickness and surface roughness of Si02

Study of the temperature effect on thickness and surface roughness of Si02

The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process....

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書誌詳細
第一著者:	Mohd Azdi Asis (著者)
フォーマット:	電子媒体ソフトウェアデータベース
言語:	English
主題:	Microelectronics.
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

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