Study of the temperature effect on thickness and surface roughness of Si02

The aims of this final year project is to study the oxidation temperature effect over the oxidation process, to study the reason why the temperature 1100℗ðC which is commonly used for the oxidation process, and to study and find the suitable time to get the optimum result for the oxidation process....

全面介紹

Saved in:
書目詳細資料
主要作者: Mohd Azdi Asis (Author)
格式: 電子 軟件 Database
語言:English
主題:
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!

System Under Maintenance

Our Library Management System is currently under maintenance.

Holdings and item availability information is currently unavailable. Please accept our apologies for any inconvenience this may cause and contact us for further assistance:

david@pintaran.my