Study of the effect of different gases parameter in dry etching process on etch rate profile

The principal focus of this project is dry etching technique by using the Inductively Couple Plasma -Reactive Ion Etching (ICP-RIE). This final year project is about to understand and control the equipment for dry etches process. The equipment in dry etch process is inductively couple plasma- reacti...

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書誌詳細
第一著者:	Zaharah Mohamad (著者)
フォーマット:	電子媒体ソフトウェアデータベース
言語:	English
主題:	Microelectronics.
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

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