Study of the effect of different gases parameter in dry etching process on etch rate profile

The principal focus of this project is dry etching technique by using the Inductively Couple Plasma -Reactive Ion Etching (ICP-RIE). This final year project is about to understand and control the equipment for dry etches process. The equipment in dry etch process is inductively couple plasma- reacti...

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Библиографические подробности
Главный автор:	Zaharah Mohamad (Автор)
Формат:	Электронный ресурс Программное обеспечение База данных
Язык:	English
Предметы:	Microelectronics.
Метки:	Добавить метку Нет меток, Требуется 1-ая метка записи!

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