Fabrication and characterization of microfluidic field effect transistor on silicon substrate /
The development of a silicon-based microfluidic field effect transistor has been carried out. The main objective of this study is to present from concept, the design of a microfluidic FET and to develop its appropriate process flow in fabricating the microfluidic FET on silicon wafer, which will fin...
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| Main Author: | |
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| Format: | Thesis Software eBook |
| Language: | English |
| Published: |
Perlis
School of Microelectronic Engineering, Universiti Malaysia Perlis
2010.
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| Subjects: | |
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| Summary: | The development of a silicon-based microfluidic field effect transistor has been carried out. The main objective of this study is to present from concept, the design of a microfluidic FET and to develop its appropriate process flow in fabricating the microfluidic FET on silicon wafer, which will finally be characterized using a suitable test methodology. Hence, fabrication on a p- <100> 4 inch silicon wafer by photolithography, wet chemical etching, thermal oxidation, diffusion and metallization with focus on a liquid conduction path has been executed. A three level photo mask has been designed via AutoCAD and chrome printed on soda-lime glass. The basic structure of the device is adapted from the conventional MOSFET structure and redesigned to incorporate a liquid channel in its operation. Therefore, the functionality remains unchanged but the principal conduction path is replaced by a fluid instead of a doped semiconductor. Two reservoirs are connected via a channel with source and drain regions doped on opposite sides of the liquid channel to reduce conduction through the substrate. |
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| Physical Description: | 1 CD-ROM 12 cm |
| Bibliography: | Includes bibliographical references (pages 98-100) |