Design and optimization of 22 nm NMOS device high-k/metal gate with bi-layer of graphene /

Design and optimization of 22 nm NMOS device high-k/metal gate with bi-layer of graphene /

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Bibliographic Details
Main Author: Suhail Firas Rosli (Author)
Format: Software eBook
Language:English
Published: 2018.
Subjects:
Dielectric devices.
Metal oxide semiconductors > Materials.
Gate array circuits > Materials.
Dielectric devices.
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