Optimization of 16nm double gate FinFET device for reduced variability and enhanced performance /

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Bibliographic Details
Main Author: Nur Habibah Ismail (Author)
Format: Book
Language:English
Published: 2018.
Subjects:
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245 1 0 |a Optimization of 16nm double gate FinFET device for reduced variability and enhanced performance /  |c Nur Habibah Ismail. 
264 1 |c 2018. 
300 |a xii, 78 pages :  |b some colour illustrations, charts, photographs ;  |c 30 cm  |e 1 computer disc (12 cm) 
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504 |a Reference : pages 76-78. 
650 0 |a Field-effect transistors   |x Computer simulation.  |9 3554 
710 1 |a Universiti Teknikal Malaysia Melaka,  |e issuing body.  |9 797 
720 |a Dr. Fauziyah Salehuddin 
790 |a Faculty of Electronic and Computer Engineering 
791 |a Bachelor of Electronic Engineering 
792 |a 2018 
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