Remote global alignment error for cycle time improvement of pad inductor layer /
Lithography is the key process which transfers the pattern from mask (reticle) to wafer; and pad inductor layer is the last layer in photo masking. The cycle time for pad inductor layer has increased in Silterra Malaysia Sdn. Bhd., by 32% per month due to Global Alignment (GA) error. Meanwhile, eng...
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| Format: | Book |
| Language: | English |
| Published: |
2018.
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