Optimization of 16nm double gate FinFET device for reduced variability and enhanced performance /
Saved in:
Main Author: | |
---|---|
Format: | Book |
Language: | English |
Published: |
2018.
|
Subjects: | |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Physical Description: | xii, 78 pages : some colour illustrations, charts, photographs ; 30 cm 1 computer disc (12 cm) |
---|---|
Bibliography: | Reference : pages 76-78. |