Aien Najihah Kamaruddin. (2015). Effect of substrate position on TiO2 thin film properties by using chemical-vapor deposition (CVD) method. Universiti Tun Hussein Onn Malaysia.
Style de citation Chicago (17e éd.)Aien Najihah Kamaruddin. Effect of Substrate Position on TiO2 Thin Film Properties by Using Chemical-vapor Deposition (CVD) Method. Batu Pahat: Universiti Tun Hussein Onn Malaysia, 2015.
Style de citation MLA (8e éd.)Aien Najihah Kamaruddin. Effect of Substrate Position on TiO2 Thin Film Properties by Using Chemical-vapor Deposition (CVD) Method. Universiti Tun Hussein Onn Malaysia, 2015.
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