Effect of substrate position on TiO2 thin film properties by using chemical-vapor deposition (CVD) method
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| Autor principal: | |
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| Autor corporatiu: | |
| Format: | Thesis Llibre |
| Idioma: | English |
| Publicat: |
Batu Pahat :
Universiti Tun Hussein Onn Malaysia ,
2015.
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| Matèries: | |
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| 100 | 0 | |a Aien Najihah Kamaruddin. , |e author |9 90021 | |
| 245 | 1 | 0 | |a Effect of substrate position on TiO2 thin film properties by using chemical-vapor deposition (CVD) method |c Aien Najihah Kamaruddin. |
| 264 | 1 | |a Batu Pahat : |b Universiti Tun Hussein Onn Malaysia , |c 2015. | |
| 300 | |a xvi, 47 pages : |b illustrations (some color) ; |c 30 cm. + |e 1 computer optical disc (4 3/4 in.). | ||
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| 650 | 0 | |a Thin films. |9 7928 | |
| 710 | |a Universiti Tun Hussein Onn Malaysia. |b Fakulti Kejuruteraan Elektrik dan Elektronik. |9 2597 | ||
| 596 | |a 1 | ||
| 790 | |a Fakulti Kejuruteraan Elektrik dan Elektronik, Universiti Tun Hussein Onn Malaysia | ||
| 791 | |a B. Eng | ||
| 792 | |a 2015. | ||
| 942 | |c THESIS_SC | ||
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| 998 | |a 1 |b Shafrizan Shafferi | ||
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