Effect of substrate position on TiO2 thin film properties by using chemical-vapor deposition (CVD) method

Effect of substrate position on TiO2 thin film properties by using chemical-vapor deposition (CVD) method

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Bibliografiska uppgifter
Huvudupphovsman:	Aien Najihah Kamaruddin (Författare, medförfattare)
Institutionell upphovsman:	Universiti Tun Hussein Onn Malaysia. Fakulti Kejuruteraan Elektrik dan Elektronik
Materialtyp:	Lärdomsprov Bok
Språk:	English
Publicerad:	Batu Pahat : Universiti Tun Hussein Onn Malaysia , 2015.
Ämnen:	Thin films.
Taggar:	Lägg till en tagg Inga taggar, Lägg till första taggen!

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