Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /
The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
שמור ב:
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| פורמט: | Thesis תכנה ספר אלקטרוני |
| שפה: | English |
| יצא לאור: |
Kangar
Universiti Malaysia Perlis (UniMAP)
2007.
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הוספת תג
אין תגיות, היה/י הראשונ/ה לתייג את הרשומה!
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| סיכום: | The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method. |
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| תאור פריט: | Tesis 2007 Accompanied by CD-ROM (901000006) |
| תיאור פיזי: | xxv, 108 p. ill. 30 cm. + 1 CD-ROM (4 3/4 in.) |