Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /

Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /

The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.

Збережено в:
Бібліографічні деталі
Автор: Mohammad Nuzaihan Bin Md Nor (Автор)
Співавтор: Universiti Malaysia Perlis
Формат: Дисертація Програмне забезпечення eКнига
Мова:English
Опубліковано: Kangar Universiti Malaysia Perlis (UniMAP) 2007.
Предмети:
Nanowires
Nanostructure materials > Electric properties
Electrochemistry.
Теги: Додати тег
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Опис
Резюме:The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
Опис примірника:Tesis 2007
Accompanied by CD-ROM (901000006)
Фізичний опис:xxv, 108 p. ill. 30 cm. + 1 CD-ROM (4 3/4 in.)

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