Fabrication of silicon nanowires using scanning electron microscope based electron beam lithography method /
The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method.
में बचाया:
| मुख्य लेखक: | |
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| निगमित लेखक: | |
| स्वरूप: | थीसिस सॉफ्टवेयर ई-पुस्तक |
| भाषा: | English |
| प्रकाशित: |
Kangar
Universiti Malaysia Perlis (UniMAP)
2007.
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| विषय: | |
| टैग : |
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| सारांश: | The goal of this research work is to form and produce very small nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Litography (EBL) method. |
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| वस्तु वर्णन: | Tesis 2007 Accompanied by CD-ROM (901000006) |
| भौतिक वर्णन: | xxv, 108 p. ill. 30 cm. + 1 CD-ROM (4 3/4 in.) |