Silicon nanowire sensor from electron beam litography : design, fabrication and characterization /
This study demonstrates the process development of silicon nanowires (SiNWs) sensor requires both the fabrication of nanoscale diameter wires and standard integration to CMOS process. There are three objectives that applied to this research work. The first objective is to design masks using GDSII Ed...
Saved in:
| 主要作者: | |
|---|---|
| 企業作者: | |
| 格式: | Thesis 圖書 |
| 語言: | English |
| 出版: |
Perlis, Malaysia
School of Microelectronic
2011.
|
| 主題: | |
| 標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
System Under Maintenance
Our Library Management System is currently under maintenance.
Holdings and item availability information is currently unavailable. Please accept our apologies for any inconvenience this may cause and contact us for further assistance: