Optimization of nitride deposition process using Taguchi method

Optimization of nitride deposition process using Taguchi method

This final year project is mainly focused on obtaining the most optimize parameters of PECVD Si3N4 deposition process by using DOE. The Taguchi method of DOE will be used in performing optimization of the deposition process. Raw data for the deposition process is provided by the deposition module fr...

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Dades bibliogràfiques
Autor principal:	Low, Zen Shiang (Autor)
Format:	Electrònic Software Base de dades
Idioma:	English
Matèries:	Microelectronics.
Etiquetes:	Afegir etiqueta Sense etiquetes, Sigues el primer a etiquetar aquest registre!

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