Optimization of nitride deposition process using Taguchi method

Optimization of nitride deposition process using Taguchi method

This final year project is mainly focused on obtaining the most optimize parameters of PECVD Si3N4 deposition process by using DOE. The Taguchi method of DOE will be used in performing optimization of the deposition process. Raw data for the deposition process is provided by the deposition module fr...

Deskribapen osoa

Gorde:

Xehetasun bibliografikoak
Egile nagusia:	Low, Zen Shiang (Egilea)
Formatua:	Baliabide elektronikoa Software Datu-basea
Hizkuntza:	English
Gaiak:	Microelectronics.
Etiketak:	Etiketa erantsi Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!

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