Optimization of nitride deposition process using Taguchi method

Optimization of nitride deposition process using Taguchi method

This final year project is mainly focused on obtaining the most optimize parameters of PECVD Si3N4 deposition process by using DOE. The Taguchi method of DOE will be used in performing optimization of the deposition process. Raw data for the deposition process is provided by the deposition module fr...

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書誌詳細
第一著者:	Low, Zen Shiang (著者)
フォーマット:	電子媒体ソフトウェアデータベース
言語:	English
主題:	Microelectronics.
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

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