Optimization of nitride deposition process using Taguchi method

Optimization of nitride deposition process using Taguchi method

This final year project is mainly focused on obtaining the most optimize parameters of PECVD Si3N4 deposition process by using DOE. The Taguchi method of DOE will be used in performing optimization of the deposition process. Raw data for the deposition process is provided by the deposition module fr...

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Opis bibliograficzny
1. autor:	Low, Zen Shiang (Autor)
Format:	Elektroniczne Oprogramowanie Baza danych
Język:	English
Hasła przedmiotowe:	Microelectronics.
Etykiety:	Dodaj etykietę Nie ma etykietki, Dołącz pierwszą etykiete!

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