APA aipamena

Chuah, S. K. Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation.

Chicago Style aipamena

Chuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.

MLA aipamena

Chuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.

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