Chuah, S. K. Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation.
Lua i Stíl Chicago (17ú heag.)Chuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
Lua MLA (8ú heag.)Chuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
Rabhadh: Seans nach mbeach na luanna seo go hiomlán cruinn i ngach uile chás.