Chuah, S. K. Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation.
Citación estilo ChicagoChuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
Cita MLAChuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
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