Chuah, S. K. Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation.
Chicago Style (17th ed.) CitationChuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
ציטוט MLAChuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
אזהרה: ציטוטים אלה לעיתים לא מדויקים ב 100%.