Chuah, S. K. Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation.
Citação do estilo Chicago (17ª ed.)Chuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
Citação MLA (8ª ed.)Chuah, Soo Kiet. Investigation and Modelling of Boron Diffusion Reduction in Silicon by Fluorine Implantation Using Numerical Simulation.
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