Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation
TThe objective of this project is to investigate the reduction of both the boron thermal diffusion and transient enhanced diffusion in silicon by fluorine implantation at the silicon surface.
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| Natura: | Elettronico Software Database |
| Lingua: | English |
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| LEADER | 01266nmi a2200241 a 4500 | ||
|---|---|---|---|
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| 003 | MY-KaKUK | ||
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| 090 | 0 | 0 | |a TK7874 |b M7C559 2007 |
| 100 | 1 | |a Chuah, Soo Kiet. |e author | |
| 245 | 1 | 0 | |a Investigation and modelling of boron diffusion reduction in silicon by fluorine implantation using numerical simulation |h [electronic resource] / |c Chuah Soo Kiet. |
| 264 | 0 | |a Perlis, Malaysia |b School of Microelectronic Engineering, Universiti Malaysia Perlis |c 2007. | |
| 300 | |a 1 CD-ROM |c 4 3/4 in. | ||
| 500 | |a Final Year Project | ||
| 520 | |a TThe objective of this project is to investigate the reduction of both the boron thermal diffusion and transient enhanced diffusion in silicon by fluorine implantation at the silicon surface. | ||
| 650 | 0 | |a Microelectronics. | |
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