Study of the effect of different gases parameter in dry etching process on etch rate profile

The principal focus of this project is dry etching technique by using the Inductively Couple Plasma -Reactive Ion Etching (ICP-RIE). This final year project is about to understand and control the equipment for dry etches process. The equipment in dry etch process is inductively couple plasma- reacti...

पूर्ण विवरण

में बचाया:

ग्रंथसूची विवरण
मुख्य लेखक:	Zaharah Mohamad (लेखक)
स्वरूप:	इलेक्ट्रोनिक सॉफ्टवेयर डेटाबेस
भाषा:	English
विषय:	Microelectronics.
टैग :	टैग जोड़ें कोई टैग नहीं, इस रिकॉर्ड को टैग करने वाले पहले व्यक्ति बनें!

समान संसाधन

Reactive ion etching (RIE) etched wet-silica-on-silicon analysis for fluidwettability
द्वारा: Noor Aini Hamimah Abd. Rahim

Study of aspect ratio performance on silicon oxide etching using profiler meter, AFM and SEM
द्वारा: Nur Syuhada Md. Desa

Comparison of etching optimization process by taguchi method using minitab and design expert software
द्वारा: Azleen Abu Talib

Dry Etching Technology for Semiconductors /
द्वारा: Nojiri, Kazuo
प्रकाशित: (2015)

Design and fabricate "wineglass" contact formation by simultaneous wet-dry etch process.
द्वारा: Mohd Norhafiz Bin. Hashim

Polysilicon process development - the effect of pecvd process parameters on the film characteristics
द्वारा: Mujahidun Mashuri

The study of the effect of MOS transistor scaling on the critical device parameters
द्वारा: Zazurina Abd Rahman

Study of the thickness of the silicon dioxide on wafer using dry and wet oxidation method
द्वारा: Mohamad Fadzli Ali

The effect of process parameters on metal step coverage for aluminum (AI) by evaporation technique
द्वारा: Noraishah Azman

Ultra violet scanner, PCB developer and etching machine
द्वारा: Nur Bazilah Mohd Suhaimi
प्रकाशित: (2010)

Ultra violet scanner, PCB developer and etching machine
द्वारा: Nur Bazilah Mohd Suhaimi
प्रकाशित: (2010)

Effect of different dielectric materials for ultrathin oxide
द्वारा: Zarimawaty Zailan

Portable etching machine/
द्वारा: Julasri Ragiman
प्रकाशित: (2018)

Etching & microscopy 09
प्रकाशित: (2009)

Portable etching machine /
द्वारा: Muhammad Azlan Shah Ibrahim
प्रकाशित: (2015)

Etching & microscopy 09
प्रकाशित: (2009)

Portable etching machine /
द्वारा: Muhammad Azlan Shah Ibrahim
प्रकाशित: (2015)

Study the effect of bird's beak on fully recessed locos and poly buffered locos using 2 different pad oxide
द्वारा: Hafizal Hafiz Sarjoni

Theoretical study, simulation & fabrication on dry oxidation in terms of Si02 layer thinckness, resistivity & surface roughness
द्वारा: Mohd Adam Alias

Simulation on effect of different types of channel/ drain engineering structure on MOS device performance
द्वारा: Norazlina Mohd Amin

Level 1 parameter extraction of MOSFET device
द्वारा: Azman mat Hussin

Study of the temperature effect on thickness and surface roughness of Si02
द्वारा: Mohd Azdi Asis

Study the effect of environmental noise on infrared Tx-Rx circuit signals
द्वारा: Mohd Zaihan Ibrahim

Simulation on parameter and characteristics extraction between two simulation packages (synopsys and pspice)
द्वारा: Nor Aznin Sakrani

Nanostructure formation using sem based e-beam lithography (EBL) technique : buffered oxide etch (BOE) profile
द्वारा: Nur Nazihah Halemi

The study on the effect of varing dopant concentration and diffusion time in the design of silicon avalanche diode with minimum VBR of 120+-20%
द्वारा: Yip, Siew Ling

Study of semi-recessed LOCOS for quasi-nanoscale CMOS devise isolation
द्वारा: Mohamad Idzham Abd Sani

Study of deposition time influence the conical structure during electron beam induced deposition (EBID)
द्वारा: Mohamad Shahrizal Md Ilias

Study and design infrared beacon for the blind
द्वारा: Mohd Fadzlie Rasit

Thin polycrystalline silicon process development
द्वारा: Muniyati Pakhuruddin

Study and improvement of UniMAP shower room
द्वारा: Lau, Iyu Pin

The effect of power density on the surface layer of amorphous thin film
द्वारा: Ahmad Fadzil Izaharuddin

Effect of diffusion coefficient and junction depth on variation of temperature and energy
द्वारा: Nur Ruzana Bohari

Optimization of nitride deposition process using Taguchi method
द्वारा: Low, Zen Shiang

Semiconductor optical amplifier (SOA) for photonic signal processing/
द्वारा: Latty Shazana Ismail
प्रकाशित: (2011)

Area array packaging processes : for BGA, flip chip and CSP /
प्रकाशित: (2004)

Area array packaging processes : for BGA, Flip Chip, and CSP /

Study the basic infrared tx-rx circuit design for robot
द्वारा: Nik Ahmad Faiz Abdul Jamel

Fabrication of 50 ¡Łm transistor and AINiAu interconnection process
द्वारा: Shaffie Husin

Optimization on oxidation process using 2K factorial design method
द्वारा: Yeap, Li Chain